Used TEL Track System ACT™ M

The TEL ACT™ M is a fully automated photoresist coating and developing system designed for wafers 150 mm (6 inches) in diameter or smaller. It is part of TEL’s classic ACT series platform.

Core Positioning: A Mainstay for Photolithography in Small-Wafer Processing

This system integrates photoresist spin-coating, hot-plate baking (soft bake/hard bake), and developing processes into a single, automated workflow for pre- and post-exposure operations. It primarily serves production lines for power semiconductors, discrete devices, MEMS, and compound semiconductors—sectors utilizing mature or specialized process technologies—and serves as a critical piece of photolithography equipment for fabs handling 6-inch or smaller wafers.

Key Technical Features

Modular Process Units: Built on a cluster architecture, the system utilizes a central robotic arm to automatically transport wafers between various process chambers. The coating unit supports a wide range of photoresists (including thick-film resists), while the hot-plate units feature multi-stage temperature control to ensure uniform coating.

High-Precision Developing and Temperature Control: Equipped with precise developer dispensing and wafer-rotation control, combined with a stable thermal management system, the platform ensures consistent critical dimension (CD) uniformity and high repeatability between batches.

Flexible Configuration and Automation: Coating, developing, and baking modules can be configured flexibly to meet specific throughput requirements. The system supports standard wafer-cassette loading/unloading and is compatible with the SECS/GEM communication standard, facilitating seamless integration into automated production lines.

Summary: With its proven coating and developing capabilities, highly integrated automated architecture, and broad compatibility with various specialized processes, the ACT™ M has established itself as a reliable, high-volume production tool for photoresist processing on 6-inch and smaller wafers.