Thermal Processing Equipment

Used ASM SONORA®

ASM SONORA® is a high-throughput vertical furnace system for 300mm wafers

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Used ASM A400™ DUO Dual Reactor Vertical Furnace System

The ASM A400™ DUO is a dual-reactor vertical furnace system designed for 200mm and smaller wafers

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Used STEAG / AST 2800 Single-Wall Rapid Thermal Processing System

This is a single-wafer rapid thermal processing (RTP/RTA) system with a large installed base in mature-node manufacturing

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Used DNS LA-820 Single-Piece Rapid Thermal Processing Equipment

The DNS LA-820 is a single-wafer Rapid Thermal Processing (RTP) system developed by Dainippon Screen (DNS)

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Used AG Associates Heatpulse 8800

The AG Associates Heatpulse 8800 is a classic single-wafer Rapid Thermal Processing (RTP) system

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Used AG Associates 8108 Thermal Processing Equipment

AG Associates' (later merged into Metron) Heatpulse 8108 is a single-wafer rapid thermal processing (RTP) system.

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Used KOYO VF-5100 Vertical Diffusion Low-Pressure Chemical Vapor Deposition Furnace

The KOYO VF-5100 is a vertical diffusion/LPCVD (Low-Pressure Chemical Vapor Deposition) furnace

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Used THERMCO 5200 Horizontal Diffusion Furnace

The THERMCO 5200 is a classic horizontal diffusion furnace from the Thermco Systems 5000 series

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Used KE DD-7460 Horizontal Diffusion Furnace

The KE DD-7460 is a horizontal diffusion furnace from Kokusai Electric

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Used KE DD-803 Vertical Diffusion Furnace

It belongs to the Vertron-III series of vertical diffusion furnaces. This is a piece of thermal processing equipment used for oxidation, diffusion, and annealing processes on semiconductor wafers.

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Used TEL IW-6D Wafer Vertical Diffusion Furnace

The TEL IW-6D is a vertical diffusion furnace designed for wafers 6 inches (150 mm) in diameter or smaller.

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Used TEL ALPHA 8S Thermal Processing Equipment

The TEL ALPHA 8S is a batch-type vertical diffusion furnace designed for 200mm (8-inch) wafers

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