English
南非荷兰语
契维语
阿姆哈拉语
阿拉伯语
阿萨姆语
艾马拉语
阿塞拜疆语
白俄罗斯语
保加利亚语
孟加拉语
波斯尼亚语
加泰罗尼亚语
宿务语
科西嘉语
捷克语
威尔士语
丹麦语
de
迪维希语
希腊语
英语
爱沙尼亚语
波斯语
芬兰语
爱尔兰语
瓜拉尼语
豪萨语
希伯来语
苗语
克罗地亚语
海地语
匈牙利语
亚美尼亚语
印尼语
冰岛语
意大利语
日语
格鲁吉亚语
高棉语
韩语
库尔德语
吉尔吉斯语
拉丁语
卢森堡语
卢干达语
林加拉语
老挝语
立陶宛语
拉脱维亚语
毛利语
马其顿语
马来语
马耳他语
缅甸语
尼泊尔语
荷兰语
挪威语
齐切瓦语
波兰语
普什图语
葡萄牙语
罗马尼亚语
俄语
卢旺达语
信德语
僧伽罗语
斯洛伐克语
斯洛文尼亚语
萨摩亚语
索马里语
阿尔巴尼亚语
塞尔维亚语
瑞典语
斯瓦希里语
塔吉克语
泰语
提格利尼亚语
土库曼语
土耳其语
乌克兰语
越南语Thin Flim Deposition Equipment
-
Used Samco PD-3800L Thin Flim Deposition Equipment
The PD-3800L is a vertical batch-type LPCVD (Low-Pressure Chemical Vapor Deposition) system from Samco
-
Samco AD-230LP Vertical Batch LPCVD (Low Pressure Chemical Vapor Deposition) System
The AD-230LP is a vertical batch-type LPCVD (Low-Pressure Chemical Vapor Deposition) system from Samco
-
TEL Triase™ Single-Wafer Thermal Atomic Layer Deposition (ALD) Platform
TEL Triase™ is a single-wafer thermal atomic layer deposition (ALD) platform from Tokyo Electron (TEL)
-
TEL TELINDY PLUS™ for sale
The TEL TELINDY PLUS™ is a batch-type thermal thin-film deposition platform for 300mm wafers
-
Used TEL TELINDY PLUS™ IRad™
The TEL TELINDY PLUS™ IRad™ is a batch-type thermal ALD/CVD deposition platform from Tokyo Electron (TEL)
-
Used TEL TELFORMULA™
TELFORMULA™ is a vertical batch CVD/ALD deposition platform from Tokyo Electron (TEL)
-
TEL NT333™ Vertical Batch Thermal Oxidation Diffusion Furnace Platform
The TEL NT333™ is Tokyo Electron's (TEL) vertical batch thermal oxidation/diffusion furnace platform
-
Used TEL Thin Flim Deposition Equipment LEXIA™-EX
The TEL LEXIA™-EX is a single-wafer dielectric thin-film deposition platform from Tokyo Electron (TEL)
-
Used TEL EXIM™
TEL EXIM™ is a single-wafer plasma-enhanced atomic layer deposition (PEALD) platform from Tokyo Electron (TEL)
-
TEL EVAROS™ for sale
TEL EVAROS™ is a single-wafer thermal atomic layer deposition (ALD) platform from Tokyo Electron (TEL)
-
Used TEL Episode™ 2 DMR Vertical Batch Furnace Deposition Platform
The TEL Episode™ 2 DMR is a vertical batch furnace deposition platform from Tokyo Electron (TEL)
-
Used TEL Episode™ 1 ALD/CVD Deposition Platform
TEL Episode™ 1 is a vertical batch ALD/CVD deposition platform from Tokyo Electron (TEL) designed for wafers 200mm in size and smaller
-
Used TEL Thin Flim Deposition Equipment ALPHA-8SE™ i
The TEL ALPHA-8SE™ i is a batch-type thermal processing and thin-film deposition system from Tokyo Electron (TEL)
-
Used SAMCO Thin Flim Deposition Equipment AL-1
The SAMCO AL-1 is an open-type thermal atomic layer deposition (ALD) system
-
Used novellus Thin Flim Deposition Equipment vector express
The Novellus (now part of Lam Research) Vector Express is a 300mm plasma-enhanced chemical vapor deposition (PECVD) system.
-
Used ASM XP8® Synergis® for sale
The ASM XP8® Synergis® is a high-throughput 300mm thermal ALD platform
-
Used ASM XP8® QCM PEALD
This is a PEALD (Plasma-Enhanced Atomic Layer Deposition) system within ASM’s XP8 platform
-
Used ASM XP8® DCM™ PEALD Thin Flim Deposition Equipment
The ASM XP8® DCM™ PEALD is a high-productivity 300mm plasma-enhanced atomic layer deposition (PEALD) system
-
Used ASM Thin Flim Deposition Equipment XP4 Pulsar®
The ASM XP4 Pulsar® is a 300mm atomic layer deposition (ALD) instrument based on the XP4 cluster platform.
-
Used ASM Thin Flim Deposition Equipment XP4 EmerALD®
The ASM XP4 EmerALD® is a fully automated plasma-enhanced atomic layer deposition (PEALD) system
