Used TEL Track System LITHIUS Pro™

The TEL LITHIUS Pro™ is a fully automated photoresist coating and developing system designed for 300 mm (12-inch) wafers. As TEL’s flagship platform for the era of advanced process nodes, it functions not merely as photoresist processing equipment, but as a highly integrated "lithography process control center."

Core Mission: Safeguarding Precision Lithography

In EUV (extreme ultraviolet) lithography and multi-patterning processes, photoresist layers are exceptionally thin and costly, making them highly sensitive to even the slightest environmental fluctuations. The primary mission of the LITHIUS Pro is to supply the scanner with wafers that feature flawless, defect-free coatings and a strictly consistent thermal history—serving as a critical hub for enhancing wafer manufacturing yields.

Unique Technological Breakthroughs (Beyond Conventional Processes)

Ultra-High-Purity Micro-Environment Control (AMC Management): Beyond preventing particulate contamination, the LITHIUS Pro excels in controlling airborne molecular contamination (AMC). Equipped with an ultra-pure local airflow system, it prevents abnormal surface reactions in the photoresist—such as the formation of "T-tops"—which is vital when working with ultra-thin EUV photoresists.

Ultra-Precise Coating and Advanced Edge Bead Removal (EBR): Optimized airflow and drainage dynamics within the spin-coater enable sub-micron precision in Edge Bead Removal (EBR). This prevents residual photoresist from flaking off during wafer transport—thereby avoiding catastrophic defects—while also significantly reducing the consumption of expensive photoresist materials.

Intelligent Thermal Control: During multi-patterning processes, temperature variations during the post-exposure bake (PEB) step can lead to critical dimension (CD) fluctuations. The system utilizes a next-generation, multi-zone, independently controlled hotplate, which delivers rapid heating and cooling alongside superior temperature uniformity, ensuring absolute consistency in the thermal budget across all production batches. Ultra-High-Throughput Architecture: LITHIUS Pro™ inherits Tokyo Electron’s signature opposing-chamber and high-density stacked design. By optimizing scheduling algorithms for its internal robotics, the system reduces per-wafer processing time, delivering exceptionally high wafer-per-hour (WPH) throughput within a minimal footprint.

In short, LITHIUS Pro™ stands as a benchmark in Tokyo Electron’s lithography process solutions, engineered specifically for advanced logic, high-end memory, and cutting-edge packaging. Through the deep integration of molecular-level contamination control, sub-micron edge processing, and ultra-precise temperature management, it ensures that high-value, advanced lithography tools operate at peak performance—making it an indispensable, intelligent process platform for GigaFabs.