Used TEL CLEAN TRACK ACT8

The TEL CLEAN TRACK ACT8 is a fully automated track system designed for 200mm (8-inch) wafers. It stands as one of the most iconic lithography-support platforms developed by TEL for the 8-inch wafer era.

Core Function: The Lithography Processing Hub for 8-inch Production Lines

The ACT8 handles all chemical and thermal processing steps for wafers before and after exposure—including photoresist spin-coating, soft baking, post-exposure baking (PEB), developing, and hard baking. It integrates seamlessly with stepper/scanner lithography systems, enabling a fully automated, high-cleanliness production workflow. It is widely utilized in the manufacturing of power semiconductors, analog chips, MEMS, and RF devices, supporting both mature process nodes and specialized technologies.

Key Technical Features

Modular Cluster Architecture: The system consists of flexible, configurable process units—such as coaters, hot plates, cooling units, and developers. The number of modules can be adjusted based on capacity requirements, balancing high throughput with process flexibility.

High-Precision Temperature and Fluid Control: Multi-zone precision hot-plate temperature control ensures uniform baking, while precise regulation of spin-coating speeds and developer flow rates guarantees consistent critical dimensions (CD) across batches.

High Cleanliness and Automation: Built-in micro-environment control suppresses particle contamination. The system supports automated wafer loading/unloading (via standards like FOUP or SMIF) and utilizes SECS/GEM communication protocols, allowing for seamless integration into automated 8-inch mass-production lines.

Summary

With its mature and stable coating/developing processes, high-capacity modular architecture, and exceptional automation integration capabilities, the ACT8 serves as a core piece of equipment for ensuring lithography yields in 200mm mature-node and specialty-process production lines.