TEL LITHIUS™ i+ Fully Automated Coating and Developing Track System

The TEL LITHIUS™ i+ is a fully automated track system for 300mm (12-inch) wafers. As a core high-volume manufacturing platform within Tokyo Electron’s (TEL) LITHIUS series, it is optimized for advanced lithography processes, including immersion lithography and extreme ultraviolet (EUV) lithography.

Core Positioning: A Super-Processing Hub for Advanced Lithography

Within the lithography workflow, the LITHIUS i+ handles all critical chemical and thermal processing steps for wafers—both before and after exposure in the scanner—including photoresist spin-coating, soft baking, post-exposure baking (PEB), development, and hard baking. It primarily serves production lines for 300mm advanced logic, high-end memory (such as 3D NAND and DRAM), and advanced packaging, acting as a vital tool for ensuring critical dimension (CD) uniformity and high manufacturing yields.

Key Technical Features

Exceptional Space Efficiency and High Throughput: Utilizing TEL’s signature vertical stacking and "opposing-chamber" layout, the system integrates a large number of process units within a minimal footprint. Combined with high-speed robotic handling, it achieves an exceptionally high wafer-per-hour (WPH) throughput.

Precise Micro-environment and Temperature Control: Given that advanced photoresists are highly sensitive to environmental conditions, the system employs high-precision micro-environment control—regulating airflow, temperature, and humidity—to effectively suppress particle contamination and airborne molecular contamination (AMC). Multi-zone hotplates further ensure superior uniformity during baking processes.

Seamless Integration with Advanced Lithography Tools: Designed specifically for direct interfacing with immersion or EUV lithography scanners, the system features robust communication capabilities (SECS/GEM) and can be seamlessly integrated into fully automated 300mm production lines.

Summary

With its superior space utilization, precise micro-environment control, and high throughput, the TEL LITHIUS™ i+ serves as an essential track system, supporting advanced lithography processes in 300mm high-end logic, memory, and specialty technology production lines.