Used DNS Track System SCW60

The DNS SCW60 is a compact coater/developer system designed for the photolithography process of 6-inch (150mm) wafers.

Core Positioning

Part of the DNS (Dainippon Screen) "Track System" product line, this equipment integrates photoresist coating and development functions onto a single platform. It is primarily targeted at discrete device manufacturing, small-batch pilot production, and R&D lines, meeting flexible production requirements through a compact footprint and simplified operation and maintenance.

Key Configuration

The SCW60 series typically features a 2C+2D configuration (2 coating units + 2 developing units), supporting continuous photoresist coating and development workflows. It is capable of processing standard photoresists as well as SOG (Spin-On Glass) films, ensuring compatibility with a wide range of photolithography process requirements.

Summary

With its integrated and compact design, the SCW60 provides a photolithography coating and development solution for 6-inch wafer production lines that balances flexibility with process completeness—making it well-suited for small-to-medium volume production and specialized process applications.