Canon Lithography Machine FPA-3030i6 for sale

The Canon FPA-3030i6, released in September 2024, is an i-line stepper designed for small-format substrates (8 inches/200mm or smaller). Its primary focus is to support the manufacturing of power devices and compound semiconductors through the use of a newly developed, high-transmittance lens.

Compared to its predecessor, the FPA-3030i5a, the FPA-3030i6 features a significant upgrade to its projection lens. By utilizing high-transmittance glass materials, the system reduces exposure aberrations by more than 50% and enhances lens durability, effectively mitigating the degradation of light transmission over long-term use. As a result, the standard throughput for 8-inch wafers has increased from 123 to 130 wafers per hour. In terms of specifications, the system offers a resolution of ≤0.35μm and an overlay accuracy of ≤40nm. The numerical aperture (NA) range has been expanded to 0.30–0.63 (with an optional low-NA configuration), allowing for the selection of an optimal NA tailored to specific device layers.

A key strength of the system is its process versatility. Beyond standard silicon substrates, it offers optional handling systems that support compound semiconductor materials—such as SiC, GaN, GaAs, and sapphire—across a size range of 2 to 8 inches. It is also capable of processing thick, thin, and warped wafers. Specifically targeting the power device and green energy technology markets, the FPA-3030i6 represents a strategic iteration of Canon’s i-line platform, designed for specialized substrates within mature manufacturing processes.