Used Canon Lithography Machine FPA-1200NZ2C

The Canon FPA-1200NZ2C is not a traditional optical lithography system, but rather a nanoimprint lithography (NIL) tool. Its core principle is akin to "stamping": a mask—etched with circuit patterns—is pressed directly into a resist layer on a wafer, eliminating the need for complex optical projection systems. Unveiled in October 2023, the system achieves a minimum linewidth of 14nm, corresponding to a 5nm process node; future enhancements to the masks could potentially enable a 10nm linewidth (2nm node). In terms of specifications, it supports 300mm wafers, features an imprint field size of 26×33mm, and offers an overlay accuracy of ≤4nm. By dispensing with the need for specialized-wavelength light sources, the system consumes significantly less power than EUV lithography equipment. It is well-suited for applications in logic chips, memory devices, and metalenses for AR/VR technologies. The first unit was delivered in 2024 to the Texas Institute for Electronics in the United States for research and development purposes.