Canon Lithography Machine FPA-5550iX for sale

The Canon FPA-5550iX is an i-line stepper designed for front-end semiconductor manufacturing, released in March 2023. It is engineered to strike a balance between a large field of view and high resolution, specifically addressing the "stitching" issues that arise when manufacturing full-frame sensors or XR displays—applications where the exposure field of conventional lithography systems (typically 26×33 mm) is insufficient.

The system utilizes a 365 nm i-line light source and features a variable numerical aperture (NA) ranging from 0.28 to 0.37. It achieves a resolution of ≤500 nm while offering an exposure field of up to 50×50 mm in a single shot. This capability eliminates the need for multi-exposure stitching when producing full-frame CMOS image sensors or micro-OLED panels, thereby preventing the yield losses often associated with the stitching process. Its alignment system incorporates a new dark-field detection function; when combined with an optional infrared (IR) wavelength—which can penetrate silicon wafers—it enables precise alignment for low-contrast marks, as well as for the backside of back-illuminated sensor wafers. Furthermore, the FPA-5550iX retains the projection lens design of its predecessor, the FPA-5510iX, with optimizations to ensure greater stability in mass production to meet robust market demand.