Used TEL Track System LITHIUS Pro™ Z

The EL LITHIUS Pro™ Z is a fully automated track system designed by Tokyo Electron (TEL) for 300mm (12-inch) wafers. As an advanced evolution of the LITHIUS Pro series, it is engineered to deliver exceptional process stability and ultra-low defect rates for EUV (extreme ultraviolet) lithography and cutting-edge logic and memory manufacturing processes.

Core Positioning: An Ultra-Clean Process Hub for the EUV Era

In EUV lithography, photoresists are extremely thin and highly sensitive to their surrounding environment. The LITHIUS Pro Z is more than just a coater/developer; it functions as a highly integrated, ultra-clean micro-environment system, ensuring that high-value EUV exposure tools can operate at peak performance.

Unique Technical Features

Advanced Molecular Contamination (AMC) Control: To address the high susceptibility of EUV photoresists to airborne molecular contaminants (AMC), the Pro Z features an upgraded internal airflow circulation and chemical filtration system. Throughout the entire wafer transport and processing sequence, wafers are maintained within an ultra-clean local micro-environment, effectively suppressing the formation of surface defects (such as "T-top" defects) on the photoresist.

High-Precision Thermal Management and Wafer Warpage Compensation: EUV and multi-patterning processes impose stringent thermal budget requirements. The system’s post-exposure bake (PEB) units offer multi-zone independent temperature control and dynamic compensation for wafer warpage, ensuring highly uniform critical dimensions (CD) during the baking process.

Superior Space Efficiency and Intelligent Scheduling: Building on TEL’s signature high-density stacking and back-to-back chamber architecture, the system integrates a vast array of process units within a minimal footprint. Coupled with AI-optimized transport algorithms, it significantly reduces per-wafer processing time, meeting the high-throughput demands of "GigaFabs." Seamless Integration with High-End Scanners: Native connectivity with state-of-the-art immersion (ArF-i) and EUV lithography systems, featuring full SECS/GEM communication and intelligent fault prediction to ensure high production line uptime.

Summary

With its superior molecular-level contamination control, precise thermal field management, and highly intelligent architecture designed for mass production, the LITHIUS Pro™ Z serves as the core coater/developer platform for overcoming the challenges of EUV lithography processes in 300mm advanced-node manufacturing.