Used DNS SKW80 Wafer Coating and Development Track System

The DNS (Dainippon Screen) SKW80 is a coater/developer track system designed for 6-inch/8-inch (150mm/200mm) wafers. It is primarily used in the photolithography process for photoresist coating, baking, and development.

Core Positioning

As part of the classic SKW series of track systems from DNS, this equipment integrates coating, baking, and development processes into a single unit. It provides consistent pre-exposure and post-exposure processing, ensuring the stability of lithographic patterns. It is mainly utilized in mature technology nodes, specialty processes, and small-to-medium-volume production lines, offering a compact, integrated architecture that meets flexible manufacturing requirements.

Key Features

Flexible Process Configuration: Typical configurations include multiple coating and developing units (e.g., 2C+2D or 1C+2D), supporting photoresist spin-coating, HMDS treatment, and precise development to accommodate various lithography process requirements.

Wafer Compatibility: Supports both 6-inch and 8-inch wafers, covering the needs of mainstream, mature-node production lines.

Temperature and Defect Control: Equipped with reliable temperature control modules and HMDS treatment units, it helps eliminate coating defects and pattern distortion, ensuring process uniformity across the wafer.

Summary

With its integrated track design and mature coating/developing capabilities, the SKW80 serves as a reliable, high-volume production tool for photoresist processing on 6-inch/8-inch wafer lines, making it well-suited for mature technology nodes and specialty process applications.