Used SAWATEC Track System SM-200

The SAWATEC SM-200 is not a fully automated track system; rather, it is a semi-automatic/manual spin-coating module. As a foundational process unit within the SAWATEC family of coating and developing equipment, it is primarily designed for laboratory use, R&D, and small-batch production.

Core Positioning

The primary function of the SM-200 is spin coating (photoresist application). Subsequent steps, such as soft baking, must be performed using a separate hot plate (e.g., the HP-200 or the Präzitherm series). It features manual substrate loading and unloading, making it well-suited for R&D environments that require frequent process recipe adjustments and do not demand high levels of automation.

Key Features

Substrate Compatibility: Supports circular wafers up to 200 mm (8 inches) or square substrates up to 150 × 150 mm; different sizes can be accommodated flexibly via quick-change chucks.

RCCT (Closed Chamber) Technology: The circular, enclosed chamber design minimizes air turbulence during rotation and maintains a solvent-saturated atmosphere, which slows the drying of the resist layer—thereby improving coating uniformity for thick films and high-viscosity materials.

Process Flexibility: Offers a rotational speed range of 1–6000 rpm (with an optional 10,000 rpm version). It supports up to 50 programmable recipes, each with 24 individual steps, and accommodates optional features such as dynamic dispensing and Edge Bead Removal (EBR).

Summary

Centered on the spin-coating process, the SM-200—with its RCCT technology and flexible, manual configuration—serves as a practical solution for photoresist application in fields such as compound semiconductors, advanced packaging R&D, and micro/nanofabrication laboratories. For users requiring a complete coating and developing workflow, SAWATEC offers higher-automation configurations, such as the Duo system (integrating spin coating and hot plates) or the CS cluster series.