Used TEL Tactras™ for sale

TEL Tactras™ is a 300mm wafer plasma etching platform from Tokyo Electron (TEL), rather than a single process chamber. Since its introduction in 2006, it has served as TEL’s primary high-volume manufacturing (HVM) platform for etching applications.

Core Positioning: High Productivity and Flexible Configuration

The core design philosophy of Tactras features a horizontally opposed chamber layout—a structure pioneered by TEL to maximize cleanroom space efficiency. The platform can accommodate up to six etching chambers, each of which can be independently configured for specific applications. Because all chambers share a common foundational design, the platform offers the flexibility to be retrofitted for different uses.

Key Features

Application Customization: The platform provides specialized chamber configurations tailored for various processes, including high-aspect-ratio etching, mask and dielectric etching, and back-end-of-line (BEOL) dielectric etching.

Process Consistency: Tactras is engineered to minimize variations between different tools and chambers. Combined with advanced particle control technology and automation, it ensures high stability for mass production.

Application-Specific Variants: Building on the Tactras platform, TEL has developed systems for targeted applications, such as Tactras-UDEMAE™ (launched in 2021) for 300mm power devices, and Tactras FAVIAS, designed for deep silicon etching (TSV applications).

Summary

Tactras serves as the foundational multi-chamber etching platform for TEL’s 300mm production lines. By integrating various process chambers, it addresses a wide range of etching requirements—from logic and memory to power devices—and stands as a core, field-proven architecture within TEL’s etching product portfolio.