Used SCREEM FC-821L Wafer Cleaner

This is a compact, batch-type wet cleaning system designed for 200mm wafers. Like the CW-2000 model you previously inquired about, it follows a batch-cleaning approach; however, the FC-821L is built on a core design philosophy of "half-pitch wafer transfer combined with single-tank processing." This configuration achieves a smaller footprint and reduced chemical consumption while offering greater process flexibility.

Key process features: The use of half-pitch wafer transfer allows for a more compact tank design, which in turn lowers the consumption of both chemicals and ultrapure water. The system incorporates a CHB (Chemical Circulation Bath) capable of handling high-temperature, high-concentration chemicals, thereby supporting a broader range of cleaning processes. Its single-tank design enables both chemical cleaning and ultrapure water rinsing to be performed in the same vessel. Since the wafers remain isolated from the ambient atmosphere throughout the process, the formation of native oxide layers is suppressed, and the wetting of intricate, fine-featured patterns is maintained. A single tank can accommodate up to five different types of chemicals, providing the flexibility to adapt to various cleaning recipes. For the drying stage, the system is equipped with a low-pressure dryer, which the manufacturer claims completely eliminates watermarks.

Positioning and distinction: The FC-821L falls under the category of batch-tank cleaning equipment. It belongs to a different process segment than the thin-film deposition, electroplating, or bonding equipment you previously looked into—it is dedicated to the wet removal of surface contaminants from wafers, rather than the addition of materials or the creation of interconnections. Compared to the CW-2000, which is oriented toward RCA-style cleaning, the FC-821L places greater emphasis on process flexibility (via multi-chemical support in a single tank) and superior watermark control. It is designed for 200mm production lines that demand high-quality cleaning performance.