Used SCREEM WS-620C

The WS-620C is a batch-type wet cleaning system (Wet Station) from SCREEN designed for 150mm wafers. Like the FC-3100 (for 300mm wafers) and the CW-2000 (a compact batch system) that you previously inquired about, it utilizes a tank-based (immersion) cleaning approach; however, the WS-620C is specifically positioned to offer flexible configuration and high throughput for production lines handling smaller-diameter wafers.

Core Specifications: Within SCREEN’s product portfolio, the WS-620C is explicitly designed for 150mm wafers and employs a carrier-transfer mechanism. It shares the same platform as the WS-820C (designed for 200mm wafers) but is configured for a different wafer size.

Flexibility and Throughput: The system can accommodate up to 16 process tanks, which can be configured according to specific process requirements. It supports up to 6 transfer robots, enabling parallel processing across multiple tanks to achieve high throughput. For the drying stage, it can be equipped with a reduced-pressure (vacuum) drying unit, which effectively prevents the formation of watermarks.

Positioning: The WS-620C is a batch-type, tank-based cleaning system tailored for mature 150mm manufacturing processes. Unlike the SS-80EX or SS-3200—which you previously looked into and which utilize single-wafer rotary brush cleaning—the WS-620C employs an immersion-based batch processing method. It is well-suited for 150mm production lines that require high throughput and flexible tank configurations, rather than for applications demanding high-precision, single-wafer cleaning.