Used STEAG / AST 2800 Single-Wall Rapid Thermal Processing System

This is a single-wafer rapid thermal processing (RTP/RTA) system with a large installed base in mature-node manufacturing, boasting over 500 units deployed worldwide.

Core Positioning

Designed as a mainstream, high-volume production RTP platform for 6-inch and 8-inch wafers, it excels in rapid heating/cooling and precise thermal budget control. It is utilized for processes such as ion implantation activation, silicide formation, BPSG reflow, shallow junction formation, and the processing of thin gate dielectrics.

Key Features

Dual-Sided Lamp Heating: Employs arrays of halogen lamps above and below the wafer, combined with a water-cooled chamber design, to ensure excellent temperature uniformity and process repeatability.

Process Flexibility: Process stabilization times can be set for up to 9,999 seconds (typically ranging from 1 to 600 seconds), allowing engineers to customize recipes for temperature, duration, and gas flow.

Typical Applications: Ion implantation annealing, polysilicon annealing, silicide/barrier layer formation, and the creation of ohmic contact alloys.

Summary

The AST 2800 is a field-proven, workhorse RTP system for 6-inch and 8-inch mature-node production lines. With its extensive installed base and mature process ecosystem, it serves critical annealing requirements across logic, power, and specialty semiconductor manufacturing processes.