Used KE DD-803 Vertical Diffusion Furnace

This unit belongs to the Vertron-III series of vertical diffusion furnaces—thermal processing equipment designed for the oxidation, diffusion, and annealing of semiconductor wafers.

Core Positioning and Capabilities

The system is primarily designed for the batch thermal processing of 6-inch (150mm) and 8-inch (200mm) wafers. Featuring a vertical furnace architecture, it utilizes multi-zone independent temperature control to facilitate impurity diffusion, silicon oxidation, or annealing at high temperatures, ensuring process repeatability through precise temperature uniformity.

Key Technical Features

Multi-zone Precision Temperature Control: The heating system consists of multiple independent PID-controlled heating zones, which eliminate axial temperature gradients within the furnace to ensure consistent thermal processing across the entire batch of wafers.

Flexible Gas Configuration: Equipped with multi-port gas manifolds and mixers, the system supports the precise mixing and switching of process gases—such as N₂, H₂, and O₂—enabling processes including H₂ annealing, oxidation, and PYRO (pyrogenic oxidation).

Automation and Safety: The system can be programmed and controlled via a touchscreen interface or dedicated software. It incorporates safety mechanisms such as over-temperature protection, emergency stops, and automatic pressure-relief valves, all in compliance with relevant SEMI standards.

Summary

The DD-803V is one of Kokusai’s primary vertical diffusion furnaces for mature-node manufacturing. With its multi-zone temperature control and versatile gas-handling capabilities, it serves critical oxidation, diffusion, and annealing steps in 6-inch and 8-inch wafer production lines.