Used NANOMETRICS AFT2100 Optical Constant Measurement System

The NANOMETRICS AFT2100 is a fully automated thin-film thickness and optical constant measurement system, serving as a standard metrology and inspection (M&I) tool in semiconductor front-end manufacturing.

Core Function: High-Precision Optical Thin-Film Metrology

This system is primarily used for the precise measurement of various thin films on wafer surfaces—such as silicon dioxide, silicon nitride, polysilicon, photoresist, and low-k dielectrics. Utilizing non-contact optical reflectance spectroscopy or ellipsometry, it performs spot checks before and after processes like deposition, etching, or chemical mechanical planarization (CMP). It acts as a critical metrology tool for maintaining process stability within a semiconductor fabrication facility (fab).

Key Technical Features

Broad-Spectrum Measurement: By employing a broadband light source for spectral analysis, the system can measure not only single-layer films but also complex multi-layer film stacks, while simultaneously extracting the material's optical constants (n and k values).

High Precision and Full Automation: Equipped with a high-precision optical platform, the system delivers exceptional measurement repeatability. It features a fully automated wafer-handling system, supports multi-point thickness mapping, and offers high throughput.

Seamless Fab Integration: Supporting the SECS/GEM communication protocol, the system enables real-time data transmission to factory MES/SPC systems, facilitating closed-loop process control (Run-to-Run feedback).

Summary

With its high-precision, non-contact optical measurement capabilities, capacity to analyze multi-layer film stacks, and full automation, the NANOMETRICS AFT2100 serves as an essential M&I tool for monitoring thin-film deposition quality and ensuring process consistency in semiconductor manufacturing.