Used SEMES IRIS PRIME

The SEMES IRIS PRIME is a fully automated, single-wafer cleaning system designed for 300mm wafers. The name "IRIS" reflects the system's integrated strengths in optical inspection and precision fluid control; it is primarily used for surface treatment processes in advanced manufacturing that demand high levels of cleanliness.

Core Positioning: Integrated Cleaning and Inspection

The defining feature of the IRIS PRIME is its deep integration of high-precision single-wafer cleaning with in-line optical inspection. Following chemical cleaning, ultrapure water (UPW) rinsing, and drying, the system can immediately scan the wafer surface for particles or defects. This provides rapid feedback on cleaning performance, thereby shortening process validation cycles and enhancing the efficiency of yield monitoring.

Key Technical Features

Precision Fluid and Drying Control: The chamber design optimizes airflow and drainage paths. Combined with sophisticated UPW rinsing and drying processes, it effectively prevents watermarks and the re-adhesion of particles, ensuring superior surface cleanliness.

Flexible Chemical Compatibility: The system supports the mixing and delivery of various chemicals—such as SC1, diluted HF, and O₃-infused water—addressing diverse cleaning requirements for applications such as post-CMP, post-etch, and pre-bonding processes.

Full Automation Integration: Equipped with standard FOUP loading/unloading and SECS/GEM communication capabilities, the system offers high throughput and can be seamlessly integrated into fully automated 300mm mass-production lines.

Summary

By integrating cleaning and inspection, the IRIS PRIME provides a solution for 300mm production lines that combines high-level cleanliness with real-time process monitoring—making it an ideal choice for advanced manufacturing steps where stringent defect control is required.