Used LAM Etching Machine ALLIANCE 4720

The Lam Research ALLIANCE 4720 is a fully automated plasma etching and ashing system designed for 200mm (8-inch) wafers, belonging to Lam’s classic Alliance platform series.

Core Positioning: Integrated Dry Processing Platform

The Alliance series is renowned for its modular, multi-chamber architecture; the 4720 model typically integrates ashing and etching capabilities. It primarily serves mature-node and specialty-process production lines, finding extensive use in the mass production of power semiconductors, analog chips, and MEMS devices.

Key Technical Features

Downstream Plasma and Gentle Ashing: The system employs a "downstream" plasma mode for photoresist removal. By stripping away high-energy ions and relying solely on reactive radicals, it effectively prevents damage from ion bombardment and the accumulation of electrostatic charge—making it exceptionally well-suited for wafers with delicate patterns or metal layers.

Multi-Chamber Integration and High Throughput: Built on the Alliance platform’s multi-chamber design, the system can be configured with multiple process chambers working in tandem to achieve high throughput. Wafers are transported automatically within a vacuum environment, which minimizes cross-contamination and enhances operational efficiency.

Mature Control and Automation: Equipped with robust endpoint detection and process control systems, the 4720 supports SECS/GEM communication, allowing for seamless integration into 200mm automated production lines, all while maintaining low maintenance costs.

Summary

With its gentle yet efficient ashing and etching capabilities, combined with a high-throughput multi-chamber design, the ALLIANCE 4720 serves as a reliable dry processing solution for 200mm mature-node and specialty-process manufacturing.