Used KOYO VF-5100 Vertical Diffusion Low-Pressure Chemical Vapor Deposition Furnace

The KOYO VF-5100 is a vertical diffusion/LPCVD (Low-Pressure Chemical Vapor Deposition) furnace, currently manufactured by JTEKT Thermo Systems (formerly KOYO Thermo Systems). Designed for large-scale thermal processing of 4- to 8-inch wafers, it is particularly well-suited for the manufacturing of power devices.

Core Positioning: An Ultra-High-Temperature Thermal Processing Platform for Power Devices

The primary strength of this system lies in its broad process temperature range—spanning from low to ultra-high temperatures—and its highly flexible configuration. Beyond standard processes such as oxidation, diffusion, annealing, and the deposition of silicon nitride or polysilicon via LPCVD, it is specifically engineered for ultra-high-temperature applications, including gate oxide nitridation and activation annealing for silicon carbide (SiC) power devices.

Key Specifications and Features

Flexible Throughput: Supports batch processing capacities ranging from 50 to 150 wafers, accommodating various production cycle requirements.

Temperature Control and Heating Options: Equipped with LGO (Low Gradient Oven) heaters for superior temperature control; optional molybdenum disilicide (MoSi₂) or carbon-based heating elements are also available to meet the demands of ultra-high-temperature processes.

Automated Wafer Handling: Features an integrated robotic wafer transfer system (supporting single-wafer or five-wafer handling) for high-speed transport, with a heated zone length of up to 960 mm.

Summary: With its wide temperature range, flexible batch configurations, and robust adaptability for power device processes—such as those for silicon carbide (SiC)—the VF-5100 has become a critical thermal processing tool for oxidation, diffusion, and advanced annealing steps in 4-, 6-, and 8-inch power semiconductor production lines.