Used TEL ANTARES™ Fully Automated Single-Wafer Cleaning System

TEL ANTARES™ is a fully automated single-wafer cleaning system designed for 300mm wafers, primarily serving high-precision surface treatment applications in advanced logic, memory, and advanced packaging manufacturing processes.

Core Positioning: High-Efficiency Single-Wafer Cleaning

The system utilizes a single-wafer rotating architecture, where each wafer is processed on a chuck through sequential stages of chemical dispensing, deionized water rinsing, and drying. This single-wafer approach eliminates the risk of cross-contamination inherent in batch processing and allows for precise control over chemical reaction times—meeting the stringent, ultra-low defect rate requirements of advanced process nodes.

Key Technical Features

Optimized Fluid and Drying Control: The process chamber is precision-engineered to manage airflow patterns and drainage paths. Combined with sophisticated rinsing and drying protocols, this effectively suppresses the formation of watermarks and prevents particle re-adhesion, ensuring a high level of surface cleanliness.

Flexible Multi-Chemical Delivery: The system supports the precise mixing and delivery of various chemicals—such as SC1, diluted HF, and O₃-infused water—enabling it to efficiently address diverse cleaning requirements, including post-CMP, post-etch, and pre-bonding applications.

High-Throughput Automation: Equipped with standard FOUP loading/unloading capabilities and SECS/GEM communication, the system delivers high throughput and integrates seamlessly into fully automated 300mm high-volume production lines.

Summary

With its refined fluid control and high operational stability, ANTARES™ serves as a critical wet-processing tool for 300mm production lines, ensuring consistent cleaning performance and improved manufacturing yields.