Used Lam Research TCP 9400 Etching Machine

The Lam Research TCP 9400 is a fully automated, high-density plasma etcher designed for 200mm (8-inch) wafers.

It utilizes Lam’s proprietary Transformer Coupled Plasma (TCP™) technology—a form of inductively coupled plasma. This high-density plasma source enables independent control of ion density and bombardment energy at low pressures, delivering high etch rates and excellent anisotropic profiles. It is specialized for the dry etching of silicon, polysilicon, and dielectric materials.

The system features precise optical endpoint detection to ensure high-selectivity processes, and comes standard with fully automated wafer handling and SECS/GEM communication capabilities. With a large installed base and a highly mature process ecosystem across the logic, memory, power device, and MEMS sectors, the TCP 9400 serves as a highly cost-effective core etching platform for 200mm production lines.