Used TEL EXPEDIUS™ -i for sale
Product Detail
The TEL EXPEDIUS™ -i is a fully automated, single-wafer cleaning system for 300mm wafers, engineered for high-precision cleaning and surface treatment in advanced logic, memory, and advanced packaging processes.
Core Positioning: High-Throughput Single-Wafer Cleaning
The system utilizes a single-wafer rotating architecture, where each wafer is processed on a chuck through sequential stages of chemical dispensing, deionized water rinsing, and drying. This single-wafer approach eliminates the risk of cross-contamination inherent in batch processing and allows for precise control over chemical reaction times—meeting the stringent, ultra-low defect density requirements of advanced technology nodes.
Key Technical Features
Optimized Fluid and Drying Control: The process chamber is precision-engineered to manage airflow and drainage paths. Combined with sophisticated rinsing and drying protocols, this effectively prevents the formation of watermarks and the re-deposition of particles, ensuring superior surface cleanliness.
Flexible Multi-Chemical Compatibility: The system supports the mixing and delivery of various chemicals—such as SC1, diluted HF, and O₃-infused water—enabling it to address diverse cleaning requirements, including post-CMP, post-etch, and pre-bonding applications.
High-Throughput Automation: Equipped with standard FOUP loading/unloading capabilities and SECS/GEM communication protocols, the system delivers high throughput and integrates seamlessly into fully automated 300mm high-volume manufacturing lines.
Summary
With its refined fluid control and high operational stability, the EXPEDIUS™ -i serves as a critical wet-processing tool for 300mm production lines, ensuring consistent cleaning performance and enhanced manufacturing yields.











