Used SCREEN SU-3300

The SCREEN SU-3300 is a fully automated single-wafer cleaning system designed for the precision cleaning of 300mm wafers used in advanced logic, memory, and advanced packaging processes.

Core Positioning: High-Efficiency Single-Wafer Cleaning

The system utilizes a single-wafer, rotating-process architecture, where each wafer is subjected to chemical dispensing, deionized water rinsing, and drying while held on a chuck. This single-wafer approach eliminates the cross-contamination risks inherent in batch processing and allows for precise control over chemical reaction times—meeting the stringent, ultra-low defect rate requirements of advanced process nodes.

Key Technical Features

Optimized Fluid Control: The SU-3300 features an optimized chamber design for airflow and fluid drainage, effectively preventing the formation of watermarks and the re-attachment of particles. Combined with multi-channel chemical supply capabilities and megasonic-assisted cleaning, it ensures the efficient removal of micro-particles and residues.

High Throughput and Automation: Equipped with standard FOUP loading/unloading interfaces and high-speed robotic wafer handling, the system delivers exceptional mass-production throughput. It supports SECS/GEM communication, enabling seamless integration into fully automated 300mm production lines.

Summary

With its high-precision fluid control and high-throughput automation, the SU-3300 serves as a critical cleaning tool for ensuring high yields in 300mm wafer manufacturing and advanced packaging production lines.