Used TEL NS300

The TEL NS300 is a fully automated single-wafer cleaning system designed for 300mm wafers, primarily serving high-precision cleaning applications in advanced logic, memory, and advanced packaging manufacturing processes.

Core Positioning: High-Efficiency Single-Wafer Cleaning

The system utilizes a single-wafer rotating architecture, where each wafer is processed on a chuck through sequential stages of chemical dispensing, ultrapure water rinsing, and drying. This single-wafer approach eliminates the risk of cross-contamination inherent in batch processing and allows for precise control over chemical reaction times—meeting the stringent requirements for ultra-low defect rates and surface integrity at advanced process nodes.

Key Technical Features

Optimized Fluid and Drying Control: The process chamber features a precision-engineered design for airflow and drainage paths. Combined with sophisticated rinsing and drying protocols, this effectively prevents the formation of watermarks and the re-adhesion of particles.

Flexible Multi-Chemical Compatibility: The system supports the mixing and delivery of various chemicals—such as SC1, diluted HF, and O₃-infused water—and incorporates megasonic assistance. This enables it to efficiently address diverse cleaning requirements, including post-CMP, post-etch, and pre-bonding applications.

High-Throughput Automation: Equipped with standard FOUP loading/unloading capabilities and SECS/GEM communication, the system delivers high throughput and integrates seamlessly into fully automated 300mm high-volume production lines.

Summary

The NS300 is a mature, production-proven 300mm cleaning platform from TEL. Renowned for its refined fluid control and high stability, it serves as a critical wet-processing tool in advanced manufacturing lines, ensuring consistent cleaning performance and improved production yields.