Used AMAT Ion Implanter 9500XR

The AMAT 9500XR is a high-current ion implanter designed for 200mm (8-inch) wafers, belonging to Applied Materials’ (AMAT) classic 9500 series platform.

Core Positioning: A Workhorse for High-Current Mass Production

This system is engineered for high-dose, high-beam-current ion implantation processes, primarily used for source/drain doping, polysilicon doping, and the formation of heavily doped contact regions. It serves as a key production tool for efficient doping in 200mm mature-node manufacturing lines (such as those for logic, memory, and power devices).

Key Technical Features

High Beam Current and High Throughput: Equipped with a high-current ion source and an optimized beam transport system, it delivers an exceptionally high dose rate, meeting the rigorous throughput requirements of high-volume 200mm wafer production.

Wide Energy Range and High Uniformity: Covering an energy range from low to medium, the system utilizes precise mechanical wafer scanning and beam parallelization control to ensure excellent intra-wafer uniformity and batch-to-batch consistency of the implanted dose.

Automation and Mature Ecosystem: The system features fully automated wafer handling as standard and supports SECS/GEM communication. The 9500 series boasts a large installed base across the industry, with well-established process recipes and relatively low costs for spare parts and maintenance.

Summary

With its high-current, high-beam-current capabilities, stable mass-production performance, and mature process ecosystem, the 9500XR stands as a primary ion implantation tool for high-dose doping tasks in 200mm mature-node manufacturing lines.