Used Lam Research 490 Fully Automated Single-Wafer Etch System

The Lam Research 490 is a fully automated, single-wafer etching system designed for 200mm (8-inch) and smaller wafers; it belongs to Lam’s classic 400 series platform.

Core Positioning: A Mainstay for High-Volume Production in Mature Nodes

This model primarily serves production lines for mature nodes and specialty processes, specializing in the dry etching of materials such as silicon, silicon dioxide, and silicon nitride. Leveraging Lam’s extensive expertise in plasma etching, the 490 platform has a large installed base in the manufacturing of power semiconductors (e.g., IGBTs, MOSFETs), MEMS, and analog chips.

Key Technical Features

Highly Stable Plasma Source: Equipped with proven radio frequency (RF) drive and gas delivery systems, the platform ensures stable and uniform plasma etching. Precise process control guarantees high consistency in etch rates and feature profiles from batch to batch.

Excellent Uniformity and Selectivity: The chamber airflow and electrode design are optimized for 200mm wafers, delivering superior within-wafer uniformity (WiWNU). The system also allows for the adjustment of etch selectivity to meet the processing requirements of various thin-film structures.

High Automation and Low Cost of Ownership: The system comes standard with a fully automated wafer transfer mechanism and supports SECS/GEM communication, enabling seamless integration into automated production lines. Given its massive installed base across the industry, the process ecosystem is highly mature, resulting in relatively low costs for spare parts and maintenance.

Summary

With its stable and reliable etching performance, exceptional uniformity control, and very low cost of ownership, the Lam 490 serves as an indispensable core etching tool for 200mm production lines focused on mature nodes and specialty processes.