Used THERMCO 5200 Horizontal Diffusion Furnace

The THERMCO 5200 is a classic horizontal diffusion furnace from the Thermco Systems 5000 series. It is designed for batch thermal processing in sectors such as semiconductors, photovoltaics, LEDs, and MEMS, and can accommodate wafers up to 150mm (6 inches) in diameter.

Core Positioning: High-Capacity Batch Thermal Processing

Compared to the 5100 model in the same series, the 5200’s primary advantage is its 1,100mm constant-temperature zone (versus 750mm for the 5100). This allows for a larger batch size per run, making it well-suited for mature, high-volume production lines that prioritize throughput. It is primarily used for processes such as oxidation, diffusion, annealing, and LPCVD.

Key Processes and Configurations

Broad Process Coverage: Highly versatile, supporting processes including silicon nitride, polysilicon, TEOS, BPSG, dry/wet oxidation, and phosphorus/boron doping.

Flexible Chamber Configuration: Can be configured with 2 to 4 process tubes and supports either cantilever or fully automated cassette-to-cassette loading/unloading systems, facilitating integration into automated production lines.

Temperature Control and Gas Systems: Equipped with 3 independently controlled heating zones, covering an operating temperature range from 200°C to 1350°C. The gas delivery system supports up to 8 mass flow controllers (MFCs) and undergoes rigorous leak testing to ensure the purity and stability of the process atmosphere.

Summary

With its high throughput—enabled by an extended constant-temperature zone—and robust process compatibility, the THERMCO 5200 serves as a reliable solution for batch thermal processing tasks, such as oxidation and diffusion, in production lines handling 6-inch (or smaller) wafers.