SEMES IRIS Fully Automated Single-Wafer Cleaning Equipment for sale

The SEMES IRIS is a fully automated, single-wafer cleaning system designed for 300mm wafers. It excels in high-precision fluid control and surface treatment, serving advanced logic, memory, and advanced packaging manufacturing processes.

Core Focus: Precision Cleaning and Surface Treatment

As a key model within the SEMES single-wafer cleaning platform, the IRIS is engineered for processes that demand exceptional particle removal efficiency and surface integrity. Utilizing a single-wafer rotating process, each wafer is subjected to sequential chemical dispensing, ultrapure water rinsing, and drying on a chuck—effectively eliminating the risk of cross-contamination inherent in batch-processing methods.

Key Technical Features

Optimized Fluid and Drying Control: The chamber interior features a precision-engineered design for airflow and drainage. Combined with meticulous rinsing and drying protocols, this effectively prevents watermarks and particle re-deposition, ensuring a high level of cleanliness.

Flexible Chemical Supply: The system supports the precise mixing and delivery of various chemicals—such as SC1, diluted HF, and O₃-infused water—and incorporates megasonic assistance. This enables it to efficiently address diverse cleaning requirements, including post-CMP, post-etch, and pre-bonding applications.

High-Throughput Automation: Equipped with FOUP loading/unloading capabilities and high-speed transfer robotics, the system supports the SECS/GEM communication protocol. Its high throughput allows for seamless integration into fully automated 300mm mass-production lines.

Summary

With its sophisticated fluid control, high stability, and high-throughput automation, the SEMES IRIS serves as a critical wet-processing tool for 300mm advanced manufacturing lines, ensuring consistent cleaning performance and improved production yields.