SEMES PURESYS for sale

SEMES PURESYS is a fully automated, single-wafer wet cleaning system designed for 300mm wafers. It is primarily used for high-precision cleaning and surface treatment in advanced logic, memory, and advanced packaging manufacturing processes.

Core Focus: High-Purity Single-Wafer Cleaning

True to its name, "PURE," this system prioritizes the achievement of exceptional surface cleanliness. It utilizes a single-wafer, rotating-chuck architecture, where each wafer undergoes sequential chemical dispensing, rinsing with ultrapure water, and drying. This single-wafer approach eliminates the risk of cross-contamination—a common concern in batch (tank-based) cleaning—and allows for precise control over chemical reaction times.

Key Technical Features

Optimized Fluid and Drying Control: The process chamber is precision-engineered to manage airflow and drainage paths. Combined with sophisticated rinsing and drying protocols, this design effectively prevents the formation of watermarks and the re-deposition of particles, ensuring superior surface cleanliness.

Flexible Multi-Chemical Compatibility: The system supports the mixing and delivery of various chemicals—such as SC1, diluted HF, and O₃-infused water—enabling it to address diverse cleaning requirements, including post-CMP, post-etch, and pre-bonding applications.

High-Throughput Automation: Equipped with standard FOUP loading/unloading capabilities and SECS/GEM communication, the system delivers high throughput and integrates seamlessly into fully automated 300mm high-volume production lines.

Summary

With its high-purity cleaning control and robust stability, PURESYS serves as a critical wet-processing tool for ensuring high product yields in 300mm advanced manufacturing lines.