Used SCREEM SP-2100

The SP-2100 is a single-wafer spin processor introduced by SCREEN in 2020. Unlike the batch-type (tank-based) systems you previously inquired about—such as the FC-3100 or CW-2000—the SP-2100 processes wafers individually. It is primarily designed to meet the cleaning requirements for compound semiconductors and power devices on substrates of 200mm or smaller.

Target Applications: As 5G smartphones, automotive electronics, and power semiconductors (e.g., SiC, GaN) frequently utilize wafers 200mm in size or smaller, SCREEN developed this single-wafer cleaning platform to offer an optimal balance of cost-effectiveness and operational flexibility.

Core Capabilities: The system supports wafer sizes ranging from 76mm to 200mm and is compatible with various materials, including silicon, SiC, GaN, and LiTaO₃. It employs a proven, stable mechanical pick-and-place wafer-handling system. It features a Multi-Task Chamber (MTC) for high-temperature, strong-acid cleaning and etching, as well as a Dry-Task Chamber (DTC) for ultrapure water rinsing and high-speed spin drying. Optional features include end-point detection sensors for highly repeatable metal etching, along with specialized cleaning tools like Nanospray or Softspray to enhance process versatility.

Design Highlights: The chemical cabinet is integrated into the main unit, saving valuable cleanroom space compared to traditional designs with external cabinets. Furthermore, the number of process chambers can be flexibly configured to meet specific production capacity requirements. In short, the SP-2100 is a single-wafer, high-volume production cleaning platform from SCREEN, tailored for compound semiconductors and mature process nodes. It complements the batch-cleaning systems you are interested in, representing a strategic division between "precision single-wafer processing" and "high-efficiency batch processing."