Used SCREEM Wafer Cleaner CW-2000

The CW-2000 is not a single-wafer cleaning tool; rather, it is a compact, batch-type wet wafer cleaning station designed primarily for mature-node production and R&D lines handling 50mm to 200mm wafers.

Core Positioning: Introduced by SCREEN in 2017, this model emphasizes a space-saving design and high cost-effectiveness. By integrating chemical supply and cooling units directly into the main chassis, the system’s footprint is reduced by approximately 45% compared to its predecessor, while throughput has increased to 150 wafers per hour—roughly 1.5 times that of the previous generation.

Process Capabilities: The system supports the standard RCA cleaning process, the prevailing wet-cleaning method for mature semiconductor manufacturing nodes. It features a flexible tank-based architecture that can be configured with 4, 6, or 8 process tanks depending on throughput requirements. For drying, it offers two options: traditional IPA-displacement drying (DIS) or a more eco-friendly, IPA-free hot-air drying (HBD) method.

In short, the CW-2000 is a batch wet-cleaning platform from SCREEN tailored for small-to-medium-sized wafers or R&D environments. It operates in a different process segment than the thin-film deposition, electroplating, or bonding equipment you have previously looked into—its function is to remove contaminants from the wafer surface, rather than to add materials or create interconnections.