Used SCREEN WS-820C Wet Station

The WS-820C is a batch-type wet cleaning system (Wet Station) from SCREEN, designed for 200mm wafers. Its core strengths lie in high throughput and highly flexible production line configuration.

Core Positioning: It utilizes a carrier-based transport method for 200mm wafers, distinguishing it from the WS-820L—a model for the same wafer size that employs a carrierless transport system.

Key Features:

Highly Flexible Configuration: The system supports a flexible arrangement of up to 16 process baths and can be equipped with as many as 6 transfer robots, enabling high throughput within a compact footprint.

Drying Quality: It can be fitted with a reduced-pressure drying unit, which effectively suppresses the formation of watermarks and ensures a clean, dry surface.

Process Stability: Optimized process bath design and rigorous chemical management ensure consistent results during batch processing.

In short, the WS-820C is a flagship model in SCREEN’s 200mm batch-cleaning portfolio. It adapts to varying production capacity requirements through flexible combinations of process baths and robots. This represents a different technical approach—batch immersion—compared to the single-wafer physical scrubbing method used by systems such as the SS series you previously inquired about.