Used VARIAN Ion Implanter E500 for sale

The Varian E500 is a high-energy ion implanter designed for wafers 200mm (8 inches) in diameter or smaller. Originally introduced by Varian Semiconductor—which was acquired by Applied Materials (AMAT) in 2011—it belongs to the classic E-series high-energy platform.

Core Positioning: A Flagship System for Ultra-High-Energy and Deep-Implant Applications

As a high-end model within the E-series, the E500 is engineered for deep-penetration doping processes that require ultra-high energy (reaching the MeV range). It is primarily utilized in 200mm production lines for the fabrication of high-voltage power devices (such as IGBTs and super-junction MOSFETs), deep photodiodes for CMOS image sensors (CIS), and deep retrograde wells or buried layers in logic chips.

Key Technical Features

Ultra-High-Energy RF Acceleration Architecture: Utilizing proven radio-frequency (RF) linear acceleration technology, the system accelerates ions to extremely high energy levels. This enables deep-layer ion implantation—reaching depths of several micrometers—to meet the stringent requirements for deep junctions in specialized devices.

Superior Energy Purity and Beam Control: Equipped with a high-precision mass-analysis magnet and an energy-filtering system, the E500 effectively eliminates energy contamination, ensuring that the depth of high-energy implants is precise and controllable. Through a combination of mechanical scanning and beam parallelization, it guarantees excellent intra-wafer dose uniformity across 200mm wafers.

A Mature and Stable Production Platform: Featuring a fully automated wafer-handling system and SECS/GEM communication capabilities, the E500 integrates seamlessly into high-volume manufacturing lines. As a classic Varian platform, it benefits from a highly mature process ecosystem, a robust supply chain for spare parts, and a comprehensive maintenance infrastructure, resulting in a low total cost of ownership.

Summary

With its powerful ultra-high-energy implantation capabilities, precise beam control, and mature production-ready architecture, the Varian E500 serves as a core high-energy ion implantation tool for 200mm production lines, specifically addressing the needs of high-voltage power devices and specialized deep-junction processes.