Used Nikon NSR-2205i11D Fully Automated Stepper Lithography Machine

The Nikon NSR-2205i11D is a fully automated stepper designed for 200mm (8-inch) wafers. Part of Nikon’s renowned NSR-2200 series (i-line platform), it represents an advanced model within the lineup, featuring optimized optical performance and enhanced process adaptability.

Core Positioning: A High-End Lithography Workhorse for Mature Process Nodes

The "i11D" designation typically indicates a lens configuration with a higher numerical aperture (NA)—approximately 0.50 or greater. This upgrade pushes the limits of resolution while maintaining the deep depth-of-focus (DOF) advantage inherent to the i-line (365nm) light source. It is well-established for high-volume production at the 0.35μm node—common for power semiconductors (such as IGBTs and MOSFETs) and analog chips—while also supporting specific process requirements at the 0.25μm node. Furthermore, it remains a preferred tool for thick-resist applications and advanced packaging technologies (e.g., RDL and micro-bumps).

Key Technical Features

Advanced i-line Optical System: Equipped with a high-NA, 5x reduction projection lens, the system delivers sub-micron resolution while providing a substantial depth of focus (DOF). This enables the tool to effectively handle the exposure of thick photoresists—often tens of microns deep—in advanced packaging, preventing issues like sidewall slope or pattern distortion.

Robust Alignment and Leveling Capabilities: The system incorporates Nikon’s proven LSA (Laser Step Alignment) and FIA (Field Image Alignment) technologies. It excels in managing challenges common in specialized processes, such as wafer warpage, thick metal layers, or non-planar surfaces, through superior dynamic leveling and signal processing, ensuring exceptional overlay accuracy.

High Throughput and Automation Integration: Featuring a fully automated 200mm wafer handling system, the tool delivers high throughput (wafers per hour). It supports SECS/GEM communication protocols, allowing for seamless integration into automated production lines. The NSR platform is highly mature, supported by an extensive library of process recipes, and offers an excellent balance of cost-effectiveness regarding spare parts and maintenance. Summary

With its advanced i-line optical configuration, the NSR-2205i11D achieves an excellent balance between resolution and depth of focus. Featuring superior capability for exposing thick photoresists, precise alignment control, and a proven, mature architecture for high-volume manufacturing, it serves as a highly valuable core lithography tool for 200mm mature-node production lines and advanced packaging processes.