Electroglas 4080X

Short Description:

The Electroglas 4080X (commonly referred to by its full name, EG Horizon 4080X) is a fully automated wafer prober designed for high-throughput semiconductor manufacturing

Product Detail

EG Probe Station 4080XThe Electroglas 4080X (often referred to by its full name, EG Horizon 4080X) is a fully automated wafer prober designed for high-throughput semiconductor manufacturing. Part of the Electroglas Horizon 4000 series, it is engineered to meet the on-wafer testing requirements of high-volume production environments. The series includes four models—the 4060X, 4080X, 4085X, and 4090—with the 4080X positioned as a mid-range model capable of handling both 6-inch and 8-inch wafers.

Core Specifications and Processing Capabilities

The 4080X supports 6-inch and 8-inch wafers and is equipped with a 10-inch vacuum chuck, capable of both single-clamping and dual-clamping operations. The system utilizes a multi-axis motion control setup, featuring a nominal precision of 0.001 mm for the X-axis and 0.005 mm for the Y-axis, achieving an overall alignment accuracy in the 5 μm range. The motion units are driven by DC servo motors, reaching speeds of up to 600 mm/s, while maintaining smooth movement and high positioning repeatability. For automated wafer handling, certain configurations allow for the loading of up to nine wafers at a time, utilizing a wafer transfer arm and flexible wafer cassettes to facilitate continuous operation.

Automation and Vision Capabilities

The Horizon 4000 series comes standard with a range of automation features, including automated probe-to-pad optimization and alignment, in-process inspection, and optical character recognition (OCR). The 4080X integrates a CCD vision system with optical zoom, supporting automatic pattern recognition to ensure precise alignment between the probe tips and the wafer surface. The series operates using Electroglas’s proprietary EGCommander system software.

Temperature Control and Options

The Horizon series offers an optional temperature-controlled chuck cover, which allows for the precise maintenance of a user-defined wafer temperature during the testing process.

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