Used Samco PD-3800L Thin Flim Deposition Equipment

The PD-3800L is a vertical batch-type LPCVD (Low-Pressure Chemical Vapor Deposition) system from Samco. Part of the same family as the AD-230LP, it is designed for mature process nodes and power device production lines utilizing wafers 200mm in diameter or smaller. Rather than targeting advanced-node, single-wafer processing, its core value lies in high-volume batch capacity and process stability.

Process Positioning: The PD-3800L utilizes LPCVD to deposit thin films, processing multiple wafers simultaneously in a single furnace tube. Typical materials deposited include polysilicon, silicon nitride, and silicon dioxide, which are used for applications such as gate polysilicon, sidewall spacers, hard masks, passivation layers, and various conformal thin-film structures. Its batch architecture delivers high throughput and low cost-per-wafer, making it well-suited for mass production at mature nodes where high throughput is prioritized and the stringent precision requirements of advanced single-wafer processing are not necessary.

Design Focus: The system emphasizes temperature uniformity and deposition repeatability. It features independent multi-zone temperature control and low-pressure processing capabilities. The reaction chamber is optimized for particle suppression and extended cleaning intervals, ensuring reliable, long-term continuous operation. The design supports multiple wafer sizes, allowing for flexible transitions between 100mm, 150mm, and 200mm wafer formats, with maintenance procedures tailored for high-volume production environments.

Contextual Positioning: Both the PD-3800L and the AD-230LP belong to Samco’s batch LPCVD platform; they differ in specific process configurations, temperature zone designs, and target applications, collectively addressing the demand for batch-processed dielectric thin films in mature-node manufacturing. The PD-3800L also complements Samco’s AL-1 thermal ALD (Atomic Layer Deposition) system, with the latter focusing on the precise, atomic-level deposition of gate oxides for power devices.

In short, the PD-3800L is a batch-type LPCVD production platform from Samco, designed for mature process nodes and the power semiconductor sector—categorized specifically as a batch furnace-style thin-film deposition system.