Used Nikon NSR-1755i7A Fully Automatic Stepper

The Nikon NSR-1755i7A is a fully automated stepper designed for 200mm (8-inch) and smaller wafers. Part of Nikon’s classic NSR series, it utilizes an i-line (365nm) light source.

Core Positioning: A High-Efficiency Mass-Production Platform for Mature Process Nodes

This model is primarily designed for high-volume production using mature and specialized process technologies, delivering exceptional throughput at resolution nodes of 0.35μm and above. It is widely used in the manufacturing of power semiconductors (IGBTs, MOSFETs), analog chips, MEMS, RF devices, and advanced packaging, serving as a primary lithography tool in 200mm wafer fabs.

Key Technical Features

High Numerical Aperture (NA) and Excellent Resolution: Equipped with a high-NA projection lens, the system leverages an i-line light source and Nikon’s mature optical architecture to ensure high pattern fidelity while maintaining stable, micron-level exposure precision.

High-Precision Alignment and Overlay: Featuring Nikon’s proven alignment system—optimized for processes involving thick photoresist and warped wafers—the tool ensures superior inter-layer overlay accuracy, meeting the stringent requirements of power devices and specialized process technologies.

High Throughput and Low Cost of Ownership: The system comes standard with a fully automated wafer-handling unit and supports SECS/GEM communication, allowing for seamless integration into automated production lines. With a large installed base and a mature process ecosystem, it offers low maintenance costs and an excellent price-performance ratio.

Summary

Combining high throughput, high-precision exposure capabilities, and robust process support, the NSR-1755i7A stands out as a highly competitive core lithography tool for 200mm production lines focused on mature and specialized process technologies.