Used ASML AT 1150 Fully Automated Stepper Lithography System

The ASML AT:1150 is a fully automated stepper designed for wafers 200mm (8 inches) in diameter or smaller. It belongs to ASML’s classic i-line (365nm wavelength) lithography platform.

Core Positioning: A Mainstay for High-Volume Production in Mature Nodes

As a classic model from the 200mm era, the AT:1150 is primarily utilized in production lines for mature nodes and specialty processes. Using a "step-and-repeat" exposure mode, it precisely patterns micron-scale features onto wafers. It is widely applied in sectors such as power semiconductors (e.g., IGBTs, MOSFETs), MEMS, analog chips, and advanced packaging.

Key Technical Features

i-line Light Source and High-Precision Alignment: The system employs a 365nm mercury lamp as its light source and integrates ASML’s mature alignment system, enabling high-precision overlay accuracy. It meets the requirements for high-volume production at resolution nodes of 0.35μm and above.

High Throughput and Automation: Equipped with an automated wafer-handling system (such as SMIF or open-cassette interfaces), the AT:1150 delivers high throughput (wafers per hour, or WPH). It supports SECS/GEM communication protocols, allowing for seamless integration into fully automated 200mm production lines.

Process Stability and Low Cost of Ownership: With a large installed base and a mature process ecosystem, this platform offers high equipment stability and relatively low maintenance costs, making it a cost-effective choice for fabs focused on mature technologies.

Summary

The AT:1150 is a hallmark of ASML’s 200mm lithography portfolio. Through its stable exposure precision, high throughput, and mature process support, it continues to provide reliable lithography solutions for production lines worldwide that specialize in mature nodes and specialty processes.