Used NIKON Lithography Machine NSR2205i9C

The Nikon NSR-2205i9C is a fully automated stepper lithography system designed for 200mm (8-inch) wafers. Part of Nikon’s classic NSR-2200 series, it utilizes an i-line (365nm) light source.

Core Positioning: A Workhorse for Mature Nodes and Specialty Processes

This model primarily serves mature process nodes of 0.35μm and above. Leveraging the superior performance of the i-line light source in thick-resist applications, it is widely used in the production of power semiconductors (such as IGBTs and MOSFETs), analog chips, MEMS, and advanced packaging. It serves as a critical tool for achieving high-precision patterning in 200mm wafer fabs.

Key Technical Features

Optimized Optical System: Equipped with a 5x reduction projection lens and an optimized numerical aperture (NA), the system—combined with an i-line light source—delivers sub-micron resolution while maintaining a large depth of focus. This makes it exceptionally well-suited for exposing thick photoresists and processing wafers with significant surface topography.

High-Precision Alignment and Overlay: The system incorporates Nikon’s proven LSA (Laser Step Alignment) and FIA (Field Image Alignment) technologies. It can automatically optimize alignment signals—even when dealing with thick resists or specialized materials—ensuring high-precision layer-to-layer overlay and low defect rates.

High Throughput and Automation: Featuring a fully automated wafer-handling system compatible with standard wafer cassettes, the unit delivers high throughput. It supports SECS/GEM communication, allowing for seamless integration into automated 200mm production lines. Its mature platform ecosystem also ensures low maintenance costs.

Summary

With its stable sub-micron exposure precision, excellent compatibility with thick-resist processes, and high-throughput automation, the NSR-2205i9C stands out as a highly cost-effective core lithography tool for 200mm mature-node and specialty-process production lines.