ASML XT:760F Fully Automated Stepper Scanning Lithography System

Short Description:

The ASML XT:760F is a fully automated step-and-scan lithography system (scanner)

Product Detail

ASML Lithography Machine XT 760FThe ASML XT:760F is a fully automated step-and-scan lithography system (scanner) designed for 200mm (8-inch) wafers. Part of ASML’s classic XT platform, it utilizes a KrF (248nm) excimer laser light source.

Core Positioning: A Workhorse for Mature Nodes and Specialty Processes

This system is primarily used for high-volume manufacturing at nodes ranging from 0.25μm to 0.11μm. Leveraging the high resolution and large depth of focus provided by its KrF light source, the XT:760F is widely deployed in production lines for logic chips, analog/mixed-signal devices, power semiconductors (such as MOSFETs and IGBTs), and MEMS. It serves as a critical tool for achieving high-precision patterning in 200mm wafer fabs.

Key Technical Features

High-NA Projection System: Equipped with a high-numerical-aperture (NA) lens and a KrF light source, the system delivers excellent sub-micron resolution. Its step-and-scan architecture ensures high pattern fidelity and minimal distortion across the entire exposure field.

High-Precision Alignment and Overlay: Featuring ASML’s advanced alignment system—optimized for processes involving thick photoresist or wafers with significant surface topography—the tool ensures high-precision layer-to-layer overlay, meeting the stringent dimensional accuracy requirements of power devices and similar components.

High Throughput and Automated Integration: The system comes standard with a fully automated 200mm wafer handling system, offering exceptional throughput (wafers per hour, or WPH). It supports SECS/GEM communication, allowing for seamless integration into automated 200mm production lines. The XT platform is mature and stable, with well-controlled maintenance costs.

Summary

Combining the superior resolution of a KrF light source with high-precision alignment capabilities and a proven, mature production platform, the XT:760F stands out as a highly competitive core lithography tool for 200mm mature-node and specialty-process manufacturing.

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